GNU social JP
  • FAQ
  • Login
GNU social JPは日本のGNU socialサーバーです。
Usage/ToS/admin/test/Pleroma FE

  • Public

    • Public
    • Network
    • Groups
    • Featured
    • Popular
    • People

Embed Notice

HTML Code

Corresponding Notice

  1. Embed this notice
    Smoljaguar (smoljaguar@spacey.space)'s status on Monday, 31-Jul-2023 01:58:01 JSTSmoljaguarSmoljaguar
    • Thomas 🔭🕹️

    @thomasfuchs sorry to tell you, but the modern naming convention of processes is no longer a technical term to do with length, and is only a marketing term. See 3rd paragraph of wiki page: https://en.wikipedia.org/wiki/3_nm_process?wprov=sfla1 . However, it's still several orders of magnitude smaller, so your point isn't undermined much!

    In conversationMonday, 31-Jul-2023 01:58:01 JST from spacey.spacepermalink

    Attachments

    1. Domain not in remote thumbnail source whitelist: login.wikimedia.org
      3 nm process
      In semiconductor manufacturing, the 3 nm process is the next die shrink after the 5 nanometer MOSFET (metal–oxide–semiconductor field-effect transistor) technology node. South Korean chipmaker Samsung started shipping its 3 nm gate all around (GAA) process, named 3GAA, in mid-2022. On December 29, 2022, Taiwanese chip manufacturer TSMC announced that volume production using its 3 nm semiconductor node termed N3 is under way with good yields. An enhanced 3 nm chip process called N3E may start production in 2023. American manufacturer Intel plans to start 3 nm production in 2023.Samsung's 3 nm process is based on GAAFET (gate-all-around field-effect transistor) technology, a type of multi-gate MOSFET technology, while TSMC's 3 nm process still uses FinFET (fin field-effect transistor) technology, despite TSMC developing GAAFET transistors. Specifically, Samsung plans to use its own variant of GAAFET called MBCFET (multi-bridge channel field-effect transistor). Intel's process dubbed "Intel 3" without the "nm" suffix will use a refined, enhanced and optimized version of FinFET technology compared to its previous process nodes in terms of performance gained per watt, use...
  • Help
  • About
  • FAQ
  • TOS
  • Privacy
  • Source
  • Version
  • Contact

GNU social JP is a social network, courtesy of GNU social JP管理人. It runs on GNU social, version 2.0.2-dev, available under the GNU Affero General Public License.

Creative Commons Attribution 3.0 All GNU social JP content and data are available under the Creative Commons Attribution 3.0 license.